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National Chung Hsing University Institutional Repository - NCHUIR > 工學院 > 工學院 > 依資料類型分類 > 期刊論文 >  Characteristics of TiVCrAlZr multi-element nitride films prepared by reactive sputtering

Please use this identifier to cite or link to this item: http://nchuir.lib.nchu.edu.tw/handle/309270000/128636

標題: Characteristics of TiVCrAlZr multi-element nitride films prepared by reactive sputtering
作者: Chang, Z.C.;Liang, S.C.;Han, S.;Chen, Y.K.;Shieu, F.S.
薛富盛
關鍵字: Multi-element alloy;Radio-frequency magnetron sputtering;Face-center-cubic solid-solution;high-entropy alloys;magnetron sputter;hard coatings;tin films;microstructure;deposition;elements;design;target
日期: 2010
Issue Date: 2012-12-07 14:57:12 (UTC+8)
關連: Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms, Volume 268, Issue 16, Page(s) 2504-2509.
摘要: Nitride films of multi-element TiVCrAlZr alloy were prepared on silicon substrates by reactive radio-frequency magnetron sputtering under different nitrogen/argon flow ratios ranging from 0% to 66.7%. The alloy film deposited in pure argon exhibited an amorphous structure and a very smooth surface, while a face-center-cubic solid-solution structure with strong (2 2 0), (1 1 1) to (2 0 0) orientation and different fracture feature and surface morphologies was observed in those films which were prepared under various nitrogen flow ratios. With increasing nitrogen flow ratio, the hardness and elastic modulus of the films increased and reached maximum values of 11 and 151 GPa at 50%. (C) 2010 Elsevier B.V. All rights reserved.
Relation: Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms
Appears in Collections:[依資料類型分類] 期刊論文
[依教師分類] 薛富盛

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