Current Nanoscience, Volume 5, Issue 3, Page(s) 297-301.
In this research, RF magnetron sputtering was employed to grow 3D nano-structured ITO thin films using the barrier-layer side of an anodic aluminum oxide (AAO) as the template. The template was prepared by immersing this side of an AAO film into a 30 wt% phosphoric acid solution to modify the surface of the barrier layer in such a manner that a contrasting surface was obtained. The resistivity and crystallinity of the deposited ITO thin film were characterized by I-V curves and X-ray diffraction (XRD). As illustrated in the I-V curve measurements, the resistivity of the ITO film after annealing was 8.25x10(-3) Omega-cm. The XRD analysis results of the annealed ITO film clearly showed the characteristic (222) and (400) peaks which characterize the crystallinity. A nano-hemispheric TiO(2)/ITO array electrode for dye-sensitized solar cells (DSSC) was further fabricated through electrophoretic deposition of TiO(2) nanoparticles on the nano-hemispheric ITO array.