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National Chung Hsing University Institutional Repository - NCHUIR > 工學院 > 生醫工程研究所 > 依資料類型分類 > 期刊論文 >  Fabrication of 3D Nano-structured ITO Films by RF Magnetron Sputtering

Please use this identifier to cite or link to this item: http://nchuir.lib.nchu.edu.tw/handle/309270000/131568

標題: Fabrication of 3D Nano-structured ITO Films by RF Magnetron Sputtering
作者: Wang, G.J.;Chen, H.T.
關鍵字: tin oxide-films;doped indium oxide;anodic porous alumina;thin-films;optical-properties;gas sensors;deposition;whiskers;oxygen
日期: 2009
Issue Date: 2012-12-07 16:28:40 (UTC+8)
關連: Current Nanoscience, Volume 5, Issue 3, Page(s) 297-301.
摘要: In this research, RF magnetron sputtering was employed to grow 3D nano-structured ITO thin films using the barrier-layer side of an anodic aluminum oxide (AAO) as the template. The template was prepared by immersing this side of an AAO film into a 30 wt% phosphoric acid solution to modify the surface of the barrier layer in such a manner that a contrasting surface was obtained. The resistivity and crystallinity of the deposited ITO thin film were characterized by I-V curves and X-ray diffraction (XRD). As illustrated in the I-V curve measurements, the resistivity of the ITO film after annealing was 8.25x10(-3) Omega-cm. The XRD analysis results of the annealed ITO film clearly showed the characteristic (222) and (400) peaks which characterize the crystallinity. A nano-hemispheric TiO(2)/ITO array electrode for dye-sensitized solar cells (DSSC) was further fabricated through electrophoretic deposition of TiO(2) nanoparticles on the nano-hemispheric ITO array.
Relation: Current Nanoscience
Appears in Collections:[依資料類型分類] 期刊論文
[依教師分類] 王國禎
[依教師分類] 王國禎

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