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National Chung Hsing University Institutional Repository - NCHUIR > 工學院 > 精密工程研究所 > 依資料類型分類 > 期刊論文 >  Concave microlens array mold fabrication in photoresist using UV proximity printing

Please use this identifier to cite or link to this item: http://nchuir.lib.nchu.edu.tw/handle/309270000/135162

標題: Concave microlens array mold fabrication in photoresist using UV proximity printing
作者: Lin, T.H.;Yang, H.;Chao, C.K.
楊錫杭
關鍵字: laser-diode;performance;deposition;lens
日期: 2007
Issue Date: 2012-12-14 11:39:13 (UTC+8)
關連: Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems, Volume 13, Issue 11-12, Page(s) 1537-1543.
摘要: This paper presents a simple and effective method for fabricating a polydimethyl-siloxane (PDMS) microlens array with a high fill factor. The proposed method utilizes the UV proximity printing and photoresist replication methods. A concave microlens array mold is made using a printing gap in a lithography process. Optical UV light diffraction of UV light is used to deflect light away from the aperture edges to produce a certain exposure in the photo-resist material outside the aperture edges. This method can precisely control the geometric profile of a concave microlens array. The experimental results show that a concave micro-lens array can be formed automatically in photo-resist when the printing gap ranges from 240 to 720 mu m. A high fill factor microlens array can be produced when the control pitch distance between the adjacent apertures of the concave microlens array is decreased to the aperture size.
Relation: Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems
Appears in Collections:[依資料類型分類] 期刊論文
[依教師分類] 楊錫杭
[依教師分類] 楊錫杭

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